The reactor and the published chain
The company's published chain names its own MOCVD equipment first, ahead of the growth step — epitaxial growth on sapphire; the chain itself is set out on the epitaxy page. What a given configuration comprises, and what it carries for the buyer's layer programme, is part of what the configuration exchange establishes for that project. The company's own production line has run reactors of this programme since 2010, when it built its UV LED line on its own equipment.
The generations in this programme's record
First GaN MOCVD system successfully developed — the programme's first reactor, completed a year after the company's founding.
3-wafer GaN MOCVD system completed — the platform steps from first system to multi-wafer production format.
6-wafer GaN MOCVD system completed — recorded in the company history as a national 863 programme project.
The company builds a UV LED production line on its own MOCVD equipment and produces 280 nm deep UV LEDs — the reactor programme becomes a production tool in its maker's own hands.
The generations are recorded by wafers per run: three wafers in the 2005 generation, six in the 2007 generation. Wafer format and loading for a new configuration are confirmed per project, against the buyer's layer programme and facility — the history above is the programme's record, not a configuration table for a new system.
The programme sits inside a national high-tech enterprise whose published history also records a 2009 restructuring, which brought in Qingdao municipal and Laoshan district government investment and a technical team of doctors returned from overseas; the company's research team is published as researchers, doctoral and master's staff. Those are company-record facts about the programme's setting. What they establish for a specific new configuration is settled per project, in the configuration exchange.
What a reactor specification has to settle
- Chamber architecture against the layer programme: the layer programme the buyer's devices are built from — GaN, AlGaN, or a research stack — stated in the enquiry; the architecture a configuration carries for it is established in the configuration exchange.
- Facility interface: gas supply, exhaust treatment, cooling and cleanroom class at the installation site.
Related equipment pages
Related pages: GaN MOCVD programme · equipment · epitaxy · process.
Reactor generations and the equipment conversation
The record above is stated as history. What a new configuration will grow for a particular layer programme is a separate question, and it is answered in the configuration exchange — against the buyer's wafer format, materials targets and throughput, not against the milestones.
Is a reactor sold as a standard model?
Configurations are specified per project. The published generations describe the programme's development record; a new system's configuration — wafer format, loading, layer programme and scope — is defined in the configuration and quotation exchange for that project.
What the configuration exchange answers
Against the buyer's wafer format, layer programme, throughput and facility inputs, the configuration exchange establishes the chamber architecture, the loading and the surrounding systems a new system will carry. The generations above are the programme's history, stated as history; a new system's configuration is the exchange's own output, defined per project.
Request a quotation
Tell us the wafer format and loading you need, the layer programme you are targeting, the throughput the system must sustain and the facility conditions at your site. Reactor configurations are specified per project.
Send an Enquiry